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The numerical investigation on the fundamental physical flow and chemical phenomena within the atomic layer deposition process
Rigardt Alfred Maarten Coetzee
Doctor of Philosophy (PHD), University of Johannesburg
2020
Handle:
https://hdl.handle.net/10210/479425
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Abstract
Please refer to full text to view abstract. Ph.D. (Mechanical Engineering)
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Coetzee_RAM Wtm1.pdf
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Title
The numerical investigation on the fundamental physical flow and chemical phenomena within the atomic layer deposition process
Creators - without role
Rigardt Alfred Maarten Coetzee
Contributors - without role
T.C. Jen
Awarding Institution
University of Johannesburg; Doctor of Philosophy (PHD)
Theses and Dissertations
Doctor of Philosophy (PHD), University of Johannesburg
Identifiers
9911638607691
Copyright
University of JohannesburgE
Academic Unit
Department of Mechanical Engineering Science
Resource Type
Dissertation
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Coetzee_RAM Wtm1.pdf