Abstract
This study reviews atomic layer deposition technique with a special interest on solar cells applications. Atomic layer deposition is a vapour phase deposition technique used for producing thin films for several applications. This review focuses on the chemistry of Atomic Layer Deposition of solar cells, merits and demerits of ALD on thin film solar cells. Solar cells have attracted a lot of interest due to their potential for affordable, clean and sustainable energy. Solar cells can be deposited using different deposition techniques but Atomic layer deposition currently attracts attention owing to the merits. ALD has functional merit to bulk materials, great processing flexibility and affordability. The review examined the merits of ALD and solar cells and areas for future study. It offers affordability, ease of control of film growth, conformal and improvement on the deposition of solar cells. Despite few demerits, ALD is poised to be the deposition technique of choice for modifying interfaces of the film for improved performance.